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EFFECT OF REACTIVELY-SPUTTERED Al_2O_3 FILMS ON OXIDATION RESISTANCE OF TiAl |
TANG Zhaolin; WANG Fuhui; WU Weitao(State key Lab for Corrosion and Protection. Young Scientists Lab of Sur face Engineering; Institute ofCorrosion and Protection of Metals; The Chinese Academy of Sciences) |
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Cite this article:
TANG Zhaolin; WANG Fuhui; WU Weitao(State key Lab for Corrosion and Protection. Young Scientists Lab of Sur face Engineering; Institute ofCorrosion and Protection of Metals; The Chinese Academy of Sciences). EFFECT OF REACTIVELY-SPUTTERED Al_2O_3 FILMS ON OXIDATION RESISTANCE OF TiAl. Chin J Mater Res, 1997, 11(5): 507-510.
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Abstract Effect of reactively-sputtered Al2O3 film on oxidation resistance of TiAl intermetallics was studied at 800~ 1000℃ in static air. The results showed that Al2O3 film improved the oxidation resistance of TiAl remarkably at 800 and 900℃. At 800℃, the Al2O3 f
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Received: 25 October 1997
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1.A.Rahmel,F.J.Spencer,Oxid.Met.35、53(1991) 2.S.Berker,M.Schutze,A.Rahmel,Oxid Met,39、93(1993) 3.按翰一,朱圣龙,王福会,吴维 金属学报, 27、B210(1991) 4.S.Taniguchi,T.Shibata,K.Takeuchi,Metall.Trans、JIM,32,299(1991) 5.E.Kobayashi,M.Yoshihara,R.J.Tanaka,Japan Inst.Metals,53,291(1989) |
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