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| Atomic oxygen erosion mechanism and effect on UV-cured blended resins |
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| 北京航空航天大学材料科学与工程学院高分子及复合材料系 |
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Cite this article:
;. Atomic oxygen erosion mechanism and effect on UV-cured blended resins. Chin J Mater Res, 2008, 22(3): 251-256.
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Abstract The blended resin systems of bisphenol A epoxy resin E-44 and silicone-epoxy resin ES-06 were UV cured．And then the atomic oxygen (AO) exposure experiments were carried out．The changes in surface composition and morphology of the polymer sample before and after AO exposure had been followed by scanning electron mictrscoly (SEM) and X-ray photoelectron spectroscopy (XPS). The mechanism of the interaction of AO with the photopolymerized silicon-containing polymer was discussed. The results show that the sample surface had been incompletely oxidized to a silicon oxide (SiOx )film after UV irradiation polymerization． Based on SEM and XPS data， it may be proposed that AO exposure of the materials produces a SiO2 film at the surface of the sample, which can protect the underlying polymer from AO erosion．The mechanism of interaction of AO with the polymer is mainly chemical reactions involved H-abstraction, replacement or bond, leading to remove the organic portions of the polymer as volatile products and leave a silicon oxide surface coating.
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Received: 01 June 2007
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