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The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films |
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中国科学院金属研究所 |
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Cite this article:
. The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films. Chin J Mater Res, 2005, 19(1): 64-71.
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Abstract The magnetron sputtering method was used to prepare Ti-base alloy films. The
concentration of the alloy elements such as Mo, Zr and Al in the films is
consistent with that in the targets, while the Y concentration has a large deviation
from that in the targets. The hydrogen absorption dynamics of the four films at 673 K
is fine and the TiZrYAl film has the best hydriding activity. The hydrogen storage
capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P--C
isotherms of the films were measured. The films alloying with Mo have the highest
hydrogen absorption equilibrium pressure, which is determined as about 10$^{-4}$ Pa
at ambient temperature.
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Received: 15 April 2004
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1 C.R.Brune, R.W.Kavanagh, Phys. Res. A, 343, 415(1994) 2 B.J.Hughey, Phys. Res. B, 95, 393(1995) 3 WANG Longbao, LV Manqi, Li Yiyi, Acta Metallurgica Sinica, 39(5), 449(2003)(王隆保,吕曼祺,李依依,金属学报,39(5),449(2003)) 4 L.C.Beavis, J. Less-Comm. Met., 27, 201(1972) 5 D.L.Smith, Thin Film Deposition (New York: McGraw-Hill Inc. Press, 1995) p.86 6 H.Kanzaki, J. Phys. Chem. Solids, 2(1), 24(1957) 7 Y.Y.Tse, D.Babonneau, Surf. Coat. Tech., 180, 470(2004) 8 P.E.Irving, C.J.Beevers, Metall. Trans., 2, 613(1971) 9 ZHENG Hua, LIU Shi, MA Aihua, WANG Longbao, Chinese Journal of Materials Research, 17(6), 590(2002)(郑华,刘实,马爱华,王隆保,材料研究学报,17(6),590(2002)) 10 A.SanMartin, F.D.Manchester, Bulletin of Alloy Phase Diagrams, 8(1), 30(1987) 11 Z.S.Wronski, Inter. Mater. Res., 46(1), 1(2001) 12 ZHAO Yue, ZHENG Hua, LIU Shi, WANG Longbao, Acta Metallurgica Sinica, 39(1), 89(2003)(赵越,郑华,刘实,王隆保,金属学报,39(1),89(2003))a |
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