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Chin J Mater Res  2005, Vol. 19 Issue (1): 64-71    DOI:
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The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films
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中国科学院金属研究所
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. The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films. Chin J Mater Res, 2005, 19(1): 64-71.

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Abstract  The magnetron sputtering method was used to prepare Ti-base alloy films. The concentration of the alloy elements such as Mo, Zr and Al in the films is consistent with that in the targets, while the Y concentration has a large deviation from that in the targets. The hydrogen absorption dynamics of the four films at 673 K is fine and the TiZrYAl film has the best hydriding activity. The hydrogen storage capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P--C isotherms of the films were measured. The films alloying with Mo have the highest hydrogen absorption equilibrium pressure, which is determined as about 10$^{-4}$ Pa at ambient temperature.
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Received:  15 April 2004     
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