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Chin J Mater Res  1997, Vol. 11 Issue (2): 158-162    DOI:
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THE PHASE TRANSITION AND PHOTOELECTRONIC PROPERTIES OF NiO_x THIN FILMS
FU Zhuxi; LIN Bixia; HAN Xianzhe; LIAO Guihong (University of Science and Technology of China)
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FU Zhuxi; LIN Bixia; HAN Xianzhe; LIAO Guihong (University of Science and Technology of China). THE PHASE TRANSITION AND PHOTOELECTRONIC PROPERTIES OF NiO_x THIN FILMS. Chin J Mater Res, 1997, 11(2): 158-162.

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Abstract  The thin films of NiOx, which thickness smaller than 0.1μm,were prepared by reactive sputtering of a Ni target with a mixed gas of argon and oxygen. The samples then were heated in air. It was found that the transmissivity and conductivity of the samples
Key words:  thin film of NiO_x oxidation photoelectronic properties     
Received:  25 April 1997     
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