Chin J Mater Res  1991, Vol. 5 Issue (2): 164-168    DOI:

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THE STUDY OF OPTIMUM PROCESS CONDITION OF Hg SENSITIZATION PHOTO-CHEMICAL VAPOR DEPOSITION SiO_2FILMS

JING Junhai SUN Qing (University of Electronics Science and Technology of Xi'an)

JING Junhai SUN Qing (University of Electronics Science and Technology of Xi'an). THE STUDY OF OPTIMUM PROCESS CONDITION OF Hg SENSITIZATION PHOTO-CHEMICAL VAPOR DEPOSITION SiO_2FILMS. Chin J Mater Res, 1991, 5(2): 164-168.

Abstract References Related Articles Recommended Metrics Download:  PDF(369KB)  Export:  BibTeX | EndNote (RIS)       Abstract  This paper discussed the principle and method of Hg sensitizationphoto-chemical vapor deposition films,studied optimum process condition of fabricationSiO_2 films.The results show that optimum process conditions:substrate temperature isabout 200℃,depositi Key words:  low-temperature      Hg sensitization      photo-chemical vapor deposition      SiO_2 films      Received:  25 April 1991      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.cjmr.org/EN/     OR     https://www.cjmr.org/EN/Y1991/V5/I2/164 1 景俊海,孙青.科学通报,1989;34(19) :1457 2 景俊海,孙青,孙建诚等.微电子学,1990;20(4) :15 3 顾原岗,沈光平,邱明新.自然杂志,1984;7(4) :289 4 Ehrlich D J et al.Appl Phys Lett,1981;38(11) :946 5 孟广耀.化学气相淀积与无机新材料.北京:科学出版社,1986:78 6 Chen Y T et al.J Electrochem Soc:Solid-Science and Technolgy,1984;131(9) :2146． 7 Kumata K et al.Appl Phys Lett.48(20) :1380 [1] LI Xiuxian, QIU Wanqi, JIAO Dongling, ZHONG Xichun, LIU Zhongwu. Promotion Effect of α-Al2O3 Seeds on Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering[J]. 材料研究学报, 2022, 36(1): 8-12. [2] WANG Peng, LU Xilong, CAO Chun-e, CHEN Yunxia, SHEN Huarong, ZHANG Xu. Influence of Nucleation-growth Liquid-liquid Phase Partition on Properties of Lead-free Low Temperature Frit[J]. 材料研究学报, 2021, 35(9): 657-666. [3] Shengwen ZHONG, Huajun ZHANG, Wenli YAO, Qian ZHANG, Yukun FU, Xiaodong TANG. Preparation and Electrochemical Performance of LiNi0.5Mn0.5-xCoxO2(0≤x≤0.12) Cathode Materials[J]. 材料研究学报, 2018, 32(7): 487-494. [4] Yayun ZHANG, Jinshan WEI, Tongbang AN, Yusong XU, Chengyong MA. Effect of Heat Input on Low-temperature Flexibility of Weld Seams of a Hull Steel via Gas-shielded Welding with Filler of Marine High Strength Flux-cored Wire[J]. 材料研究学报, 2018, 32(4): 309-314. [5] Wenshen YANG,Lin LANG,Xiuli YIN,Chuangzhi WU. Influencing Factors on Formation of SWCNTs in the Channels of AFI Molecular Sieves by Low-temperature Hydrocracking[J]. 材料研究学报, 2017, 31(6): 401-409. [6] . Mechanical Behavious of Ti6Al4V Alloy during Low-temperature Superplastic Deformation[J]. 材料研究学报, 2008, 22(3): 269-273. [7] LEI Weisheng; YAO Mei(Tsinghua Universily)(Harbin Institute Of Technolgy). EFFECT OF HOT STRAININGEMBRITTLEMENT ON CLEAVAGE CHARACTERISTICSTRESS S_(co) OF 16Mn STEEL[J]. 材料研究学报, 1994, 8(2): 142-143. [8] LEI Weisheng;GUO Yongliang;YAO Mei;TIAN Xitang(Harbin Institute of Technology). EFFECT OF STRAIN RATE ON CLEAVAGE CHARACTERISTIC STRESS S_(co)OF MILD STEEL[J]. 材料研究学报, 1992, 6(4): 301-303. [9] LI Daoming;YAO Mei(Harbin Institute of Technology). CRITICAL CRACK SIZE FOR LOW-TEMPERATURE BRITTLENESS OF MILD STEEL IN TENSION OF CENTER-CRACKED SHEET[J]. 材料研究学报, 1992, 6(2): 98-102. [10] JING Junhai SUN Qing FU Junxing SUN Jiancheng (University of Electronics Science and Technology of Xi'an). LOW-TEMPERATURE Hg SENSITIZED PHOTOCHEMICAL VAPOR DEPOSITED Si_3N_4 FILMS[J]. 材料研究学报, 1991, 5(3): 247-251. [11] LI Daoming LEI Weisheng YAO Mei (Harbin Institute of Technology). AN EXTENDED STUDY ON THE CRITICAL CRACK SIZE FOR LOW-TEMPERATURE BRITTLE FRACTURE OF STRUCTURAL STEELS UNDER FLUCTUATING LOAD[J]. 材料研究学报, 1991, 5(3): 232-237. No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed