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Chin J Mater Res  1997, Vol. 11 Issue (2): 203-206    DOI:
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A NEW FABRICATION METHOD OF HIGH MELTING POINT METAL COATING
TANG Bin; HE Jiawen; WANG Congzen; XU Zhong (Xi'an Jiaotong University) (Taiyuan Polytechnic University)
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TANG Bin; HE Jiawen; WANG Congzen; XU Zhong (Xi'an Jiaotong University) (Taiyuan Polytechnic University). A NEW FABRICATION METHOD OF HIGH MELTING POINT METAL COATING. Chin J Mater Res, 1997, 11(2): 203-206.

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Abstract  A new multiple hollow cathode sputtering target, which has a simple structure and a high sputtering rate,was put forward. The sputtering rate can be controlled by changing target voltage, pressure and H. D-1. The result shows that this method has a high d
Key words:  hollow cathode sputtering coating     
Received:  25 April 1997     
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1.唐宾,王从曾,苏永安,徐重.中国专利 891037438. 1989年 8月
2.王从曾,唐宾,徐重.金属热处理学报.12(3),43(1991
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