2003, Vol. 17

Issue (2): 145-150 DOI:

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. . Chin J Mater Res, 2003, 17(2): 145-150.

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Received: 01 January 1900

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1 R.D.K.Misra, R.Sivakumar, Bffect of NaCl vapor on the oxidation of Ni-Cr alloys, Oxid. Met., 25, 83(1986)
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4 SHU Yonghua, WANG Fuhui, ZHOU Longjiang, WU Weitao, Effect of solid NaCl and water vapor on the corrosion of Ti60 alloys, Chinese Journal of Metals Research, 13(6), 613(1999) (舒勇华,王福会,周龙江,吴维(?),水蒸气和NaCl作用下的Ti60合金的腐蚀,材料研究学报,13(6),613(1999))
5 SHU Yonghua, WANG Fuhui, WU Weitao, Synergistic effect of NaCl and water vapor on the corrosion of FeCr alloys at 600℃, Acta Metallurgica Sinaca, 35(10), 1074(1999) (舒勇华,王福会,吴维(?),NaCl和水蒸气对Fe-Cr合金腐蚀行为的影响,金属学报,35(10),1074(1999))
6 J.Shen, L.Zhou, T.Li, High-temperature oxidation of FeCr alloys in wet oxygen, Oxid. Met., 48, 347(1997)
7 SHU Yonghua, WANG Fuhui, ZHOU Longjiang, WU Weitao, Corrosion behavior of a steel 1Cr11Ni2W2MoV coated with NaCl in wter vapor at 500-700℃, Acta Metallurgica Sinaca, 34(5), 483(1998) (舒勇华,王福会,周龙江,吴维(?),在500～700℃水蒸气和Na- Cl协同作用下1Cr11Ni2W2MoV钢的腐蚀,金属学报,34(5), 483(1998))
8 Shu Yonghua, Wang Fuhui, Wu Weitao, Synergistic effect of NaCl and water vapor on the corrosion of 1Cr11Ni2W2MoV steel at 500-700℃, Oxid. Met., 52(5/6), 463(1999)
9 LI Mingsheng, WANG Fuhui, WANG Tiegang, SUN Chao, WEN Lishi, Investigation of phase structure and performance of (Ti, A1)N films deposited by are ion plationg, Acta Metallurgica Sinaca, 30(1), 55(2003) (李明升,王福会,王铁钢,孙超,闻立时,Al含量对电弧离子镀(Ti1-xAlx)N复合镀层的结构和性能的影响,金属学报, 39(1),55(2003))
10 Changjie Feng, Mingsheng Li, Li Xi, Shenglong Zhu, Fuhui Wang, Mechanical properties and oxidation behavior of a graded (Ti,Al)N coating deposited by arc-ion plating, Oxid. Met., 65, 307(2006)
11 Chung Wan Kim, Kwang Ho Kim. Anti-oxidation properties if TiAlN film prepared by plasma-assisted chemical vapor depositon and roles of Al, Thin Solid Films. 307, 113 (1997)
12 S.Menzel, Th.Gobel, K.Bartsch, K.Wetzig, Phase transitions in PACVD-(Ti,Al)N coatings after annealing, Surf. Coat. Technol., 124, 190(2000)
13 Shozo Inoue, Hitoshi Uchida, Yukio Yoshinaga, Keiji Koterazawa, Oxidation behavior of (Ti1-xAlx)N films perpared by rf reactive sputtering, Thin Solid Films, 300, 171(1997)e

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