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| COMPUTER SIMULATION ON THE DEPOSITION-DIFFUSION PROCESS IN F_e-65_(mg)·g~(-1) Si ALLOY THIN RIBBON |
| WANG Yandong; XU Jiazheng; ZUO Liang; LIANG Zhide(Northeastern University)Correspondent:(Department of Materials Science and Engineering; Northeastern University;Shenyang 110006) |
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Cite this article:
WANG Yandong; XU Jiazheng; ZUO Liang; LIANG Zhide(Northeastern University)Correspondent:(Department of Materials Science and Engineering; Northeastern University;Shenyang 110006). COMPUTER SIMULATION ON THE DEPOSITION-DIFFUSION PROCESS IN F_e-65_(mg)·g~(-1) Si ALLOY THIN RIBBON. Chin J Mater Res, 1996, 10(2): 125-129.
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Abstract The 'deposition-diffusion' method has now been used as an important approach to the preperation of some spotal materials. In this paper, its industrial applicabitity in the production of Fe-65 mg·g-1 Si alloy thin ribbons under various heat treatment cond
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Received: 25 April 1996
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| 1TsuyaN,AraiKlSolidStatePhysics,1978,13:2372TakadaY,AbeM,MasudaSetal．JApplPhys,1988,64(10):53673山路常弘．CAMP-ISIJ,1993,6:18244平谷多津彦．CAMP-ISIJ,1993,6:18255CahnRW．物理金属学,中册,北京:科学出版社,1970:1596CrankJMathematicsofDiffusion,OxfordPress,1965:2727BorgRJ,LaiDYF,JApplPhys,1970,41:51938MiramiHVM,MaaskantP．PhysStatSol(a),1972,14:521 |
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