|
|
偏压对阴极电弧离子镀AlN薄膜的影响 |
黄美东1;2; 董闯1;宫骏2;卢春燕2;孙超2;黄荣芳2; 闻立时2 |
1 大连理工大学三束材料改性国家重点联合实验室 2 中国科学院金属研究所 |
|
引用本文:
黄美东; 董闯; 宫骏; 卢春燕; 孙超; 黄荣芳; 闻立时 . 偏压对阴极电弧离子镀AlN薄膜的影响[J]. 材料研究学报, 2001, 15(6): 675-680.
1 G.A.Slack, J.Phys.Chem.Solids, 34, 321(1973) 2 K-H.Hellwege, Landolt-Bornstein Numerical Data and Functional Relationships in Science and Technology,Vol.17,(Berlin, Springer-Verlag, 1982) P.158 3 P.Martin, R.Netterfield, T.Kinder, A.Bendavid, Appl.Opt., 31, 6734(1992) 4 W.M.Yim, E.J.Stofko, P.J.Zanzucchi, J.I.Pankove, M.Ettenberg, S.L.Gilbert, J.Appl.Phys., 44(1), .292(1973) 5 R.Macmahon, J.Affinito, R.J.Parsons, J.Vac.Sci.Technol., 20, 376(1982) 6 吴 音,缪卫国,刘耀诚,周和平,材料研究学报,12(2),139(1998)(WU Yin, MIAO Weiguo, LIU Yaocheng, ZHOU Heping, Chinese J. Mater. Res., 12(2), 139(1998)) 7 陈克新,葛昌纯,曹文斌,李江涛,材料研究学报,13(3),273(1999)(CHEN Kexin, GE Changchun, CAO Wenbin, LI Jiangtao, Chinese J. Mater. Res., 13(3), 273(1999)) 8 周和平,陈 浩,吴 音,缪卫国,刘 希,材料研究学报,12(1),25(1998)(ZHOU Heping, CHEN Hao, WU Yin, MIAO Weiguo, LIU Xi, Chinese J. Mater. Res., 12(1), 25(1998)) 9 T.Shiosaki, T.Yamamoto, T.Oda, A.Kawabata, Appl.Phys.Lett., 36, 643(1980) 10 Y.G Roman, A.P.M. Adriaasen, Thin Solid Films, 169, 241(1989) 11 J.K.Liu, K.M.Lakin, K.L.Wang, J.Appl.Phys., 46, 3703(1975) 12 S.Yoshida, S.Misawa, A.Ito, Appl.Phys.Lett., 26, 461(1975) 13 H.Lee, J.Y.Lee, J.Mater.Sci.: Mater.in Electro., 8, 385(1997) 14 J.Yang, C.Wang, X.S.Yan, K.Tao, Y.D.Fan, J.Phy D:Appl.Phys., 27, 1056(1994) 15 Y.Murayama, K.Kashiwagi, M.Kikuchi, J.Vac.Sci.Technol., 17(4), 796(1980) 16 V.Talyansky, R.D.Vispute, R.Ramesh, R.P.Sharma, T.Venkatesen, Y.X.Li, L. G. Salamanca-Riba,M.C.Wood, R.T.Lareau, K.A.Jones, A.A.Iliadis, Thin Solid Films, 323, 37(1998) 17 I.Petrov, L.Hultman, J.E.Aundgren, J.Vac.Sci.Techn., A10(2), 265(1992) 18 A.R.Navarro, W.O.Rivera, J.M. Garcia-Ruiz, R.Messier, L.J.Pilione, J.Mater.Res., 12(7), 1850(1997) 19 王 浩,黄荣芳,吴 杰,洪瑞江,闻立时,无机材料学报,8(3),321(1993)(WANG Hao, HUANG Rongfang, WU Jie, HONG Ruijiang, WEN Lishi, Chinese J.Inorg.Mater., 8(3),321(1993)) 20 杨 杰,王 晨,陶 琨,范玉殿,无机材料学报,8(3),316(1993)(YANG Jie, WANG Chen, TAO Kun, FAN Yudian, Chinese J. Inorg. Mater., 8(3), 316(1993)) 21 Y.M.Chiang, D.P.Birnie, W.D.Kingery in "Physical Ceramics ",(John Wiley & Sons, Inc., 1977) p.31 22 A.Grill, Cold Plasma in Materials Fabrication,(New York: IEEE Press 1994) p.3 23 Joint Committee on Powder Diffraction Standards, "Powder Diffraction File ",(International Center forPowder Diffraction Data, Swartmore, PA,1984), Card No.: 25-1133 24 I.Petrov, L.Hultman,U. Helmersson, J.E.Sundgren, J.E.Greene, Thin Solid Films, 169, 299(1989) 25 韩立民主编,等离子热处理(天津,天津大学出版社,1997)p.185(HAN Limin, Heat Treatment by Plasma,(Tianjin, Tianjin University Press, 1997) p.185) 26《电子工业技术词典》编委会编,(北京,国防工业出版社,1979)p.6~50(《A Technical Dictionary for Electronics》 by Committee,(Beijing, National Defence Industry Press,1979) p.6-50) |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
|
Shared |
|
|
|
|
|
Discussed |
|
|
|
|