|
|
氮对纳米硅氮薄膜品化的影响 |
韩伟强;韩高荣;聂东林;丁子上 |
浙江大学材料系;清华大学物理系;山东建材学院 |
|
INCORPORATION EFFECT OF NITROGEN INTO nc-SiN_x:H FILMS |
HAN Weiqiang;HAN Gaorong; NIE Donglin;DING Zishang(Zhejiang University;Tsinghua University;Shangdong Bwilding Materials Industry College)(Correspondent:HAN Weiqiang;Department of Physics;Tsinghua University;Beijing 100084) |
引用本文:
韩伟强;韩高荣;聂东林;丁子上. 氮对纳米硅氮薄膜品化的影响[J]. 材料研究学报, 1996, 10(3): 289-292.
,
,
,
.
INCORPORATION EFFECT OF NITROGEN INTO nc-SiN_x:H FILMS[J]. Chin J Mater Res, 1996, 10(3): 289-292.
1MattenbergerF,VeprekS.Chemtronics,1986,1:1072OtobeM,OdaS.JpnJApplPhys,1992,31:19483何宇亮,殷晨钟.半导体学报,1992,13:6834HANW,HANGMatResSocsymp,1993,297:3815FurukawaS,MiyasatoT,PhysRevB,1988,38:57266TakagiHetal、ApplPhysLett,1990,56:23797FortunateEetal.JNon—CrystSolids1989,115;1208HasegawaSetal.JapJApplPhys.1986,25;L9349KarcherRetal.PhsRevB,1984,30:1896 |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
|
Shared |
|
|
|
|
|
Discussed |
|
|
|
|