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Chin J Mater Res  1996, Vol. 10 Issue (5): 494-496    DOI:
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THE INITIAL STAGE OF ION BEAM DEPOSITING Ti AND Ni FILM GROWTH
YANG Chunsheng;ZHOU Di;QI Zhenzhong;ZHANG Shoubo;CAI Bingchu(Shanghai Jiaotong University)
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YANG Chunsheng;ZHOU Di;QI Zhenzhong;ZHANG Shoubo;CAI Bingchu(Shanghai Jiaotong University). THE INITIAL STAGE OF ION BEAM DEPOSITING Ti AND Ni FILM GROWTH. Chin J Mater Res, 1996, 10(5): 494-496.

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Abstract  The initial stage of ion beam sputtered Ni and Ti film has been investigated in situ using AES .The results show that the film growth model of Ti and Ni films sputtered on Si single crystal (100) surface are FM model i.e layer by layer growth model. The f
Key words:  initial stage of film growth; layer growth model     
Received:  25 October 1996     
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