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SURFACE DAMAGE OF LiNbO_3 IMPLANTED BY Ti ION |
ZHOU Jianhua;YOU Boqiang;ZHANG Liangying;YAO Xi(Xi'an Jiaotong University) |
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Cite this article:
ZHOU Jianhua;YOU Boqiang;ZHANG Liangying;YAO Xi(Xi'an Jiaotong University). SURFACE DAMAGE OF LiNbO_3 IMPLANTED BY Ti ION. Chin J Mater Res, 1992, 6(6): 514-518.
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Abstract Damage and annealing effect of x,y and z cut LiNbO_3 implanted by 350keVhigh energy Ti(1.5×10~(17)/cm~2)were studied.The damage caused by ion implantation is re-moved by high temperatures annealing in dry oxygen atomsphere at different temperatures andtim
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Received: 25 December 1992
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1 Jackel J L et al.Appl Phys Lett,1981;38(7) :509 2 Eknoyan O et al.Appl Phys Optics,1986;25(5) :737 3 Batfoo K M et al.Radiation Effects in Insulators,1985;3:415 4 Li M J et al.Optics Communications,1987;62(1) :17 5 Yao X,Cross L E.Ferroelectrics,1981;38:82 |
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