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材料研究学报  1995, Vol. 9 Issue (2): 158-162    
  研究论文 本期目录 | 过刊浏览 |
Sol-gel生长KTa_(1-x)Nb_xO_3电光薄膜的成分和结构
卢朝靖;王世敏;邝安祥;黄桂玉;王龙海;王典芬
湖北大学;武汉工业大学;南京大学物理系
XPS STUDY OF THE COMPOSITION AND STRUCTURE OF KTN ELECTROOPTIC THIN FILMS FORMED BY SOL-GEL PROCESS
LU Chaojing; WANG Shiming; KUANG Anxiang; HUANG Guiyu; WANG Longhai (Hubei University)WANG Dianfen(Wuhan University ofTechnology)(Department of Physics; Nanjing University; Nanjing 210008)
引用本文:

卢朝靖;王世敏;邝安祥;黄桂玉;王龙海;王典芬. Sol-gel生长KTa_(1-x)Nb_xO_3电光薄膜的成分和结构[J]. 材料研究学报, 1995, 9(2): 158-162.
, , , , , . XPS STUDY OF THE COMPOSITION AND STRUCTURE OF KTN ELECTROOPTIC THIN FILMS FORMED BY SOL-GEL PROCESS[J]. Chin J Mater Res, 1995, 9(2): 158-162.

全文: PDF(424 KB)  
摘要: 采用XPS方法研究了sol-gel工艺制备的KTN(x=0.35)薄膜的成分和结构.结果表明,除了表面被碳污染外,薄膜中无残余的碳和其他杂质.其成分与原料的化学计量比相近,且沿深度均匀分布.各元素的化学状态证实薄膜系钙钛矿型KTN结构.Ar+溅射后的XPS谱反映K严重偏低,Ta和Nb的化学状态改变,是Ar+轰击引起K择优溅射及化合物分解所致.
关键词 钽铌酸钾(KTN)薄膜X射线光电子能谱(XPS)溶胶-凝胶法(sol-gel)Ar ̄+溅射    
Abstract:Epitaxial KTN (x=0.35) eletrooptic thin films were formed on (100) SrTiO3 substrates by sol-gel process.In this peper, wide and narrow scans of XPS analyses were studied on the surface of KTN thin films before and after Ar+ SPuttering for 10min. The resul
Key words chemical composition    valence state. XPS    sol-gel    KTN thin film. Ar~+ sputtering
收稿日期: 1995-04-25     
基金资助:国家自然科学基金
1OrlowskiR,BoatnerLA,KratigE.OPtCommun,1980;35(1):452BonnerWA,DearbronEF,VanUitertLG,AmCeramSocBull,1965;44(1):93DebelyPE,EunterPE,ArendH.AmCeramSocBull,1979;58(6):6064卢朝靖,王世敏,邝安样等.科学通报,1994:39(4):185包定华,邝安祥,王世敏等.科学通报,1992;37(16):14706卢朝靖,王世敏,邝安祥等.无机材料学报.1993;8(4):4657WagnerCDetal.HandbookofX-rayPhotoelectronSpectroscopy.Perkin-ElemerCorporationPhysicalElectronicsDivision.PrintedinU.S.A,19798刘世宏,王当憨,潘承璜.X射线光电子能谱分析,北京:科学出版社,1988:250
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