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材料研究学报  2005, Vol. 19 Issue (1): 64-71    
  论文 本期目录 | 过刊浏览 |
磁控溅射Ti合金薄膜结构特征及贮氢性能
马爱华;郑华;于洪波;刘实;王隆保
中国科学院金属研究所
The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films
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中国科学院金属研究所
引用本文:

马爱华; 郑华; 于洪波; 刘实; 王隆保 . 磁控溅射Ti合金薄膜结构特征及贮氢性能[J]. 材料研究学报, 2005, 19(1): 64-71.

全文: PDF(1364 KB)  
摘要: 采用磁控溅射方法制备了Ti膜及TiMo、TiMoYAl和TiZrYAl等三种合金膜. 合金膜中Mo、Zr和Al三种元素成份与靶材成分基本一致, 而Y元素则与靶材成分有较大的偏差. 在400℃吸氢工艺下, 四种膜材的吸氢动力学性能良好, 没有脱膜现象, 饱和吸氢量均可超过1.5(H/M). 膜材的吸氢PCT曲线表明, 含Mo合金膜材具有最高的吸氢平衡压, 外推出的室温下的数量级约为10$^{-4}$Pa.
Abstract:The magnetron sputtering method was used to prepare Ti-base alloy films. The concentration of the alloy elements such as Mo, Zr and Al in the films is consistent with that in the targets, while the Y concentration has a large deviation from that in the targets. The hydrogen absorption dynamics of the four films at 673 K is fine and the TiZrYAl film has the best hydriding activity. The hydrogen storage capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P--C isotherms of the films were measured. The films alloying with Mo have the highest hydrogen absorption equilibrium pressure, which is determined as about 10$^{-4}$ Pa at ambient temperature.
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收稿日期: 2004-04-15     
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