CHARACTERIZATION OF EPOXIDE RESINS BY TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMETRY (TOF-SIMS)

Chin J Mater Res

1995, Vol. 9

Issue (5): 457-462 DOI:

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CHARACTERIZATION OF EPOXIDE RESINS BY TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMETRY (TOF-SIMS)

DENG Zhaohui; CHEN Weixiao; ZONG Xiangfu (Fuden University)

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DENG Zhaohui; CHEN Weixiao; ZONG Xiangfu (Fuden University). CHARACTERIZATION OF EPOXIDE RESINS BY TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMETRY (TOF-SIMS). Chin J Mater Res, 1995, 9(5): 457-462.

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Abstract Two kinds of epoxide resins made in China have been characterized by time-of-flight secondary ion mass spectromctry (TOF-SIMS) combined using thin-film silver cationization. Authors have found some different epoxide resin components, their possible struct

Key words: Time-of-flight Secondary ion Mass SPeCtrometry (TOF-SIMS) epoxide resin silver cationization

Received: 25 October 1995

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https://www.cjmr.org/EN/ OR https://www.cjmr.org/EN/Y1995/V9/I5/457

1SteffensP,NiehuisE,FrieseTetal．JVacSciTechnol,1985;A3(3):13222MawnMPetal,JVacSciTechnol,1991;A9(3):13073VanD,Leyenetal,JVacSciTechnol,1989;A7(3):17904BletsosIV,HerculusDM,GreifendorfDetal．AnalChem,1985;57:23845VanDerwelH,JLub,SurfaceandInterfaceAnalysis,1993;20:3736TrevertonJA,PaulAJ,VickermanJC,SurfaceandInterfaceAnalysis,1993;20:4497NiehuisE,HellerT,FeldH,etal,JVacsciTechnol,1987;AS(4):12438SchuelerB,SanderP,ReedRA,Vacuum,1990;41:16619EcclesAJ,VickermanJC,JVacSciTechnol,1989;A7(2):23410NiehuisE,VanVehenPNTetal,SurfaceandlnterfaeeAnalysis,1989;14:13511BriggsD,HearnMJ,Vacuum,1986;36:1005

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