Chin J Mater Res  1996, Vol. 10 Issue (4): 415-418    DOI:

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THERMAL-SENSITIVE CHARACTERISTICS OF BORON-DOPED DIAMOND FILMS

JIA Yuming; YANG Bangchao; LI Yanrong (University of Electronic Science & Technology of China)ZHENG Changqiong; GOU Li; RAN Junguo (Sichuan Union University)(Correspondent:Institute of Information Materials Engineering;University of Electronic Science & T

JIA Yuming; YANG Bangchao; LI Yanrong (University of Electronic Science & Technology of China)ZHENG Changqiong; GOU Li; RAN Junguo (Sichuan Union University)(Correspondent:Institute of Information Materials Engineering;University of Electronic Science & T. THERMAL-SENSITIVE CHARACTERISTICS OF BORON-DOPED DIAMOND FILMS. Chin J Mater Res, 1996, 10(4): 415-418.

Abstract References Related Articles Recommended Metrics Download:  PDF(302KB)  Export:  BibTeX | EndNote (RIS)       Abstract  Boron-doped diamond films are deposited on the substrate Si3N4 by using microwave PCVD. Ti films are evaporated on the diamond films as ohmic contact electrodes, and then Au films are covered on the Ti films in order to protect the Ti films from oxygenat Key words:  boron-doped      diamond films      thermal-sensitive characteristics      Received:  25 August 1996      Service E-mail this article Add to citation manager E-mail Alert RSS （） Articles by authors URL:  https://www.cjmr.org/EN/     OR     https://www.cjmr.org/EN/Y1996/V10/I4/415 1NaojiFujimori,HideakiNakahatk．InMYoshikawaed．NewDiamond,JapanNewDiamondForum,1990:982蒋翔六主编．金刚石薄膜研究进展．北京:化学工业出版社,1991:104 [1] SHAO Siwu, ZHENG Yuting, AN Kang, HUANG Yabo, CHEN Liangxian, LIU Jinlong, WEI Junjun, LI Chengming. Progress on Application of Bias Technology for Preparation of Diamond Films[J]. 材料研究学报, 2022, 36(3): 161-174. [2] XU Yue ZHANG Tong LI Liuan LI Hongdong LU Xianyi JIN Zengsun. Analysis of residual stress and micro--stress in free--standing boron--doped polycrystalline diamond films by XRD[J]. 材料研究学报, 2009, 23(3): 264-268. [3] WANG Hao;ZHU Hesun;SHEN Mingrong;NING Zhaoyuan(Beijing Institute of Technology) (Suzhou University). REVIEW ON THE NUCLEATION MECHANISM OF DIAMOND FILMS BY CHEMICAL VAPOR DEPOSITION[J]. 材料研究学报, 1998, 12(6): 570-574. No Suggested Reading articles found! Viewed Full text Abstract Cited   Shared      Discussed