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| LOW-TEMPERATURE DEPOSITION OF DIAMOND FILM BY LASER CVD |
| FENG Zhongchao; ZHANG Bingchun;ZHAO Yan;WANG Yaqing(Institute of Metal Research; Chinese Academy of Sciences) |
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Cite this article:
FENG Zhongchao; ZHANG Bingchun;ZHAO Yan;WANG Yaqing(Institute of Metal Research; Chinese Academy of Sciences). LOW-TEMPERATURE DEPOSITION OF DIAMOND FILM BY LASER CVD. Chin J Mater Res, 1996, 10(5): 521-524.
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Abstract Diamond films have been synthesized by LCVD through combined effect of ultraviolet XeCl laser and infrared CO2 laser. The substrates are Si wafers. A special apparatus has been developed. The deposition conditions have been studied. Raman spectra of the f
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Received: 25 October 1996
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| 1KitahamaK,HirataK,NakamatsuH,KawaiS．ApplPhysLett,1986、49(1):6342GotoY,YagiT,NagaiH．MatResSocSympProc,1989,129:2133TyndallGeorgeW．HackerNigelP．MatResSocSymp,1990,162;1734NarayanJ．GodboleVP,MateraG．JApplPhys,1992,71(2):996 |
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