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材料研究学报  2007, Vol. 21 Issue (3): 261-266    
  论文 本期目录 | 过刊浏览 |
硅烷偶联剂在二氧化硅基片表面吸附膜的形貌
蔡楚江  沈志刚  邢玉山  麻树林
引用本文:

蔡楚江; 沈志刚; 邢玉山; 麻树林 . 硅烷偶联剂在二氧化硅基片表面吸附膜的形貌[J]. 材料研究学报, 2007, 21(3): 261-266.

全文: PDF(2904 KB)  
摘要: 使用原子力显微镜(AFM)观测了吸附在二氧化硅基片表面的硅烷偶联剂薄膜的形貌.结果表明,在气相法吸附过程中偶联剂是以分子形态吸附在基片表面,而在液相法吸附过程中偶联剂是以分子聚合体的形态吸附在基片表面,因此通过气相法吸附在基片表面的吸附膜比通过液相法吸附在基片表面的吸附膜光滑.硅烷偶联剂在二氧化硅基片表面有化学吸附和物理吸附两种模式,吸附了硅烷偶联剂薄膜的基片表面呈现出一定的疏水性.
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收稿日期: 1900-01-01     
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