制备工艺参数对磁控溅射Ni5Pt薄膜的影响

张铭原, 闻明, 李思勰, 张滨, 张广平

Effect of Processing Parameters on Magnetron Sputtering Preparation of High-quality Ni5Pt Films for Schottky Diodes

ZHANG Mingyuan, WEN Ming, LI Sixie, ZHANG Bin, ZHANG Guangping

图4 Ni5Pt薄膜表面的TEM照片和晶粒尺寸分布直方图

Fig.4 Bright field TEM images (a, b) and HRTEM images (c, d) of Si(100)-RT1M (a, c) and Si(111)-RT1M (b, d), and corresponding grain size distribution (e), the insets are the fast FFT patterns