单晶碳化硅接触中亚表层损伤与破坏机理的原子尺度分析
王胜, 周俏亭, 占慧敏, 陈晶晶

Atomic Analysis of Contact-induced Subsurface Damage Behavior of Single Crystal SiC Based on Molecular Simulation
WANG Sheng, ZHOU Qiaoting, ZHAN Huimin, CHEN Jingjing
表1 单晶碳化硅亚表层损伤的相变结构类型转化数目随使役温度的变化
Table 1 The transformation number of phase change structure types in the subsurface damage of single crystal silicon carbide varies with the service temperature
LoadingTemperature / K
Variable529880013005298800130052988001300
Depth / nmOther structureCD1st+CD2nd structureHD+HD1st+HD2nd structure
0000000000000
2528885107212031808918367188341979500192464
2.42080162714241336191401959820189210940576111823
34096299627932526218562132122381232497044811183454
492236289499044602526326353273562874215551026746165
4.4117927854553957352688628221291243035417663735507928