Cu掺杂非晶碳薄膜的电学性能及其载流子输运行为

闫春良, 郭鹏, 周靖远, 汪爱英

Electrical Properties and Carrier Transport Behavior of Cu Doped Amorphous Carbon Films

YAN Chunliang, GUO Peng, ZHOU Jingyuan, WANG Aiying

图12 Cu掺杂量不同的a-C: Cu薄膜在不同温度范围的ln(R)与T-1/4和T-1的关系曲线

Fig.12 Relationship between ln(R) and T-1/4 (a, c, e, f) and T-1 (b, d) at different temperature ranges for the samples with different Cu contents. The red lines are fitting results