Cu掺杂非晶碳薄膜的电学性能及其载流子输运行为

闫春良, 郭鹏, 周靖远, 汪爱英

Electrical Properties and Carrier Transport Behavior of Cu Doped Amorphous Carbon Films

YAN Chunliang, GUO Peng, ZHOU Jingyuan, WANG Aiying

图7 Cu含量为2.77%和7.28%样品的高分辨电子图像和选区电子衍射图

Fig.7 HRTEM image and corresponding SAED of a-C: Cu film with 2.77% (a, b) and 7.28% Cu (c, d)