Cu掺杂非晶碳薄膜的电学性能及其载流子输运行为

闫春良, 郭鹏, 周靖远, 汪爱英

Electrical Properties and Carrier Transport Behavior of Cu Doped Amorphous Carbon Films

YAN Chunliang, GUO Peng, ZHOU Jingyuan, WANG Aiying

图1 高功率脉冲磁控溅射设备的示意图

Fig.1 Schematic diagram of the HiPIMS deposition equipment