偏压技术在金刚石薄膜制备中应用的进展
邵思武1, 郑宇亭1,2, 安康1,2, 黄亚博1, 陈良贤1, 刘金龙1, 魏俊俊1, 李成明1(
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Progress on Application of Bias Technology for Preparation of Diamond Films
SHAO Siwu1, ZHENG Yuting1,2, AN Kang1,2, HUANG Yabo1, CHEN Liangxian1, LIU Jinlong1, WEI Junjun1, LI Chengming1()
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图12. 在0 V、 -100 V、 -200 V和、-300 V偏压下生长的beg-NCD薄膜的SEM照片，插图为横截面形貌[
Fig.12. SEM micrographs of beg-NCD films grown under 0 V (a), -100 V (b), -200 V (c) and -300 V (d) with the inset showing the cross sectional SEM micrographs [
