偏压技术在金刚石薄膜制备中应用的进展
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邵思武 1, 郑宇亭 1,2, 安康 1,2, 黄亚博 1, 陈良贤 1, 刘金龙 1, 魏俊俊 1, 李成明 1(  )
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Progress on Application of Bias Technology for Preparation of Diamond Films
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SHAO Siwu 1, ZHENG Yuting 1,2, AN Kang 1,2, HUANG Yabo 1, CHEN Liangxian 1, LIU Jinlong 1, WEI Junjun 1, LI Chengming 1(  )
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图6. 典型偏压辅助化学气相沉积设备示意图[44~47]
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Fig.6. Typical bias assisted CVD equipments[44~47] (a) commercial Microwave Plasma CVD, (b) Antenna-Edge Microwave Plasma CVD, (c) Dc plasma CVD, (d) HFCVD system
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