偏压技术在金刚石薄膜制备中应用的进展
邵思武1, 郑宇亭1,2, 安康1,2, 黄亚博1, 陈良贤1, 刘金龙1, 魏俊俊1, 李成明1()
Progress on Application of Bias Technology for Preparation of Diamond Films
SHAO Siwu1, ZHENG Yuting1,2, AN Kang1,2, HUANG Yabo1, CHEN Liangxian1, LIU Jinlong1, WEI Junjun1, LI Chengming1()

图6. 典型偏压辅助化学气相沉积设备示意图[44~47]

Fig.6. Typical bias assisted CVD equipments[44~47] (a) commercial Microwave Plasma CVD, (b) Antenna-Edge Microwave Plasma CVD, (c) Dc plasma CVD, (d) HFCVD system