偏压技术在金刚石薄膜制备中应用的进展
邵思武1, 郑宇亭1,2, 安康1,2, 黄亚博1, 陈良贤1, 刘金龙1, 魏俊俊1, 李成明1(
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Progress on Application of Bias Technology for Preparation of Diamond Films
SHAO Siwu1, ZHENG Yuting1,2, AN Kang1,2, HUANG Yabo1, CHEN Liangxian1, LIU Jinlong1, WEI Junjun1, LI Chengming1()
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图5. 直流偏压、直流脉冲偏压、脉冲叠合偏压和双极脉冲偏压[
Fig.5. DC bias voltage (a), DC pulsed bias voltage (b), pulse superposition bias voltage (c) and bi-directional pulsed bias voltage (d) [
