α籽晶促进低温反应溅射沉积α-Al2O3薄膜

李修贤, 邱万奇, 焦东玲, 钟喜春, 刘仲武

Promotion Effect of α-Al2O3 Seeds on Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering

LI Xiuxian, QIU Wanqi, JIAO Dongling, ZHONG Xichun, LIU Zhongwu

表1 在不同温度溅射Al+α-Al2O3复合靶和Al靶沉积薄膜的元素组成

Table 1 Elementary compositions of the films deposited at different temperatures by sputtering Al target and Al+α-Al2O3 composite target

Temperature /℃ Target Compositions of the films /%, atom fraction O Al O / Al 500 Al 59.78 40.22 1.48 560 Al 60.14 39.86 1.51 560 Al/α-Al2O3 59.52 40.48 1.47