α籽晶促进低温反应溅射沉积α-Al2O3薄膜
李修贤, 邱万奇, 焦东玲, 钟喜春, 刘仲武

Promotion Effect of α-Al2O3 Seeds on Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering
LI Xiuxian, QIU Wanqi, JIAO Dongling, ZHONG Xichun, LIU Zhongwu
图6 在600℃溅射时间不同的α-Al2O3籽晶的形貌
Fig.6 Morphology of α-Al2O3 seed deposited at 600℃ for 15 min (a), 30 min (b), 60 min (c) and 120 min (d)