氧控In2O3薄膜的光电性能
Optical and Electrical Properties of Oxygen-controlled In2O3 Film
氧控In2O3薄膜的光电性能 |
| 孙茂林, 宫震, 王施文, 尹航, 李瑞武, 张政, 李雨彤, 吴法宇 |
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Optical and Electrical Properties of Oxygen-controlled In2O3 Film |
| SUN Maolin, GONG Zhen, WANG Shiwen, YIN Hang, LI Ruiwu, ZHANG Zheng, LI Yutong, WU Fayu |
| 图1 In2O3薄膜的退火处理曲线(a)和SEM照片：制备于纯Ar气氛(b)；制备于氧分压为1.0×10-2 Pa的气氛(c)；退火于氧分压为1.0×10-2 Pa的气氛(d) |
| Fig.1 Annealing curve (a) and SEM images of In2O3 film prepared in pure Ar atmosphere (b), in the condition of oxygen partial pressure 1.0×10-2 Pa (c) and annealed under oxygen partial pressure 1.0×10-2 Pa (d) |
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