用<strong>RF-PECVD</strong>法制备类金刚石薄膜

用RF-PECVD法制备类金刚石薄膜

熊文文, 何嵩, 郑淞生, 程其进, 沈宏勋, 陈朝

Preparation of Diamond-like Carbon Films on Top and Bottom Plates by RF-PECVD

XIONG Wenwen, HE Song, ZHENG Songsheng, CHENG Qijin, SHENG Hongxun, CHEN Chao

表2 薄膜和厚度和沉积速率

Table 2 Film thickness and deposition rate

$V_{C H_{4}} / V_{A r}$	Deposition time/min	Thickness /nm		Deposition rate /nm·min^-1
$V_{C H_{4}} / V_{A r}$	Deposition time/min	Top plate	Bottom plate	Top plate	Bottom plate
1:3	30	557.68	127.68	18.60	4.25
1:2	30	587.00	174.32	19.57	5.81
1:1	30	646.55	215.50	21.55	7.18
3:1	30	854.86	332.71	28.50	11.09
5:1	30	791.96	301.56	26.40	10.05
7:1	30	626.14	129.12	20.87	4.30
8:1	30	386.91	47.32	12.90	1.58