低能大流强氢离子辐照对钨的刻蚀行为
玄京凡, 范红玉(
), 白樱, 胡瑞航, 李昕洋, 陶文辰, 倪维元(), 牛金海
), 白樱, 胡瑞航, 李昕洋, 陶文辰, 倪维元(), 牛金海
Etching Behavior of Tungsten under Irradiation of Low Energy and High Flux Hydrogen Ions
XUAN Jingfan, FAN Hongyu(), BAI Ying, HU Ruihang, LI Xinyang, TAO Wenchen, NI Weiyuan(), NIU Jinhai
), BAI Ying, HU Ruihang, LI Xinyang, TAO Wenchen, NI Weiyuan(), NIU Jinhai
图5. 采用导电原子力显微镜分析不同离子能量辐照后钨的表面形貌(左图)和缺陷电流分布图像(右图)
Fig.5. CAFM analysis of the surface topography (left) and the simultaneously measured current images (right) of W irradiated with different H ion energy (a) 0 eV, (b) 20 eV, (c) 40 eV and (d) 60 eV
