低能大流强氢离子辐照对钨的刻蚀行为
玄京凡, 范红玉(
), 白樱, 胡瑞航, 李昕洋, 陶文辰, 倪维元(), 牛金海
), 白樱, 胡瑞航, 李昕洋, 陶文辰, 倪维元(), 牛金海
Etching Behavior of Tungsten under Irradiation of Low Energy and High Flux Hydrogen Ions
XUAN Jingfan, FAN Hongyu(), BAI Ying, HU Ruihang, LI Xinyang, TAO Wenchen, NI Weiyuan(), NIU Jinhai
), BAI Ying, HU Ruihang, LI Xinyang, TAO Wenchen, NI Weiyuan(), NIU Jinhai
图4. W溅射率随H离子能量的变化
Fig.4. W sputtering yields as a function of H ion energy.
