溅射沉积掺Ag的SnSe薄膜的微结构和热电性能
李贵鹏1, 宋贵宏1(
), 胡方1, 杜昊2, 尹荔松3
), 胡方1, 杜昊2, 尹荔松3
Structure and Thermoelectric Properties of Ag-doped SnSe Thin Films Deposited by Magnetron Sputtering
LI Guipeng1, SONG Guihong1(), HU Fang1, DU Hao2, YIN Lisong3
), HU Fang1, DU Hao2, YIN Lisong3
图3. 不同Ag含量SnSe薄膜的截面形貌
Fig.3. Fracture cross-sections of SnSe thin films deposited with different Ag contents (atomic fraction) (a) 0% Ag, (b) 4.42% Ag, (c) 7.97% Ag, (d) 12.46% Ag, (e) 15.55% Ag
