氮流量比对磁控溅射(CoCrFeNi)Nx高熵合金薄膜的组织和性能的影响
刘晓东1,谈淑咏2,霍文燚1,张旭海1,邵起越1,方峰1(
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Effect of Nitrogen Flow Ratio on Microstructure and Property of High-Entropy Alloy Films (CoCrFeNi)Nx Prepared by Magnetron Sputtering
Xiaodong LIU1,Shuyong TAN2,Wenyi HUO1,Xuhai ZHANG1,Qiyue SHAO1,Feng FANG1()
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图4. 氮流量比不同的(CoCrFeNi)Nx薄膜的AFM形貌图
Fig.4. AFM morphologies of (CoCrFeNi)Nx films with different nitrogen flow ratio (a) RN=10%, (b) RN=20%, (c) RN=30%
