氮流量比对磁控溅射(CoCrFeNi)Nx高熵合金薄膜的组织和性能的影响
刘晓东,谈淑咏,霍文燚,张旭海,邵起越,方峰

Effect of Nitrogen Flow Ratio on Microstructure and Property of High-Entropy Alloy Films (CoCrFeNi)Nx Prepared by Magnetron Sputtering
Xiaodong LIU,Shuyong TAN,Wenyi HUO,Xuhai ZHANG,Qiyue SHAO,Feng FANG
表1 氮流量比不同的薄膜的成分
Table 1 Film composition with different nitrogen flow ratio (%, atomic fraction)
Nitrogen flow ratioCoCrFeNiN
RN=10%22.2420.6415.6529.4711.99
RN=20%20.1119.0714.5228.1118.18
RN=30%18.9117.9014.6526.7921.75