树枝状介孔氧化硅磨粒的制备和抛光性能
王婉莹1,陈爱莲2,3,马翔宇1,蔡文杰1,陈杨1(
)
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Preparation and Polishing Performance of Dendritic Mesoporous Silica Particle Abrasives
WANG Wanying1,CHEN Ailian2,3,MA Xiangyu1,CAI Wenjie1,CHEN Yang1()
)
图7. 抛光后表面在722.1 μm×962.8 μm范围内的形貌
Fig.7. Surface morphology within 722.1 μm×962.8 μm of the polished surface
