用PECVD工艺制备功能装饰氧化硅薄膜的性能

张栋,柯培玲,汪爱英,王香勇,智理

Properties of Functional Decorative Silicon Oxide Films Prepared by PECVD

Dong ZHANG,Peiling KE,Aiying WANG,Xiangyong WANG,Li ZHI

图16 使用不同气源制备的阴极薄膜在可见光范围内的透过率

Fig.16 Transmittance of cathode films in visible light range at different gas sources