用PECVD工艺制备功能装饰氧化硅薄膜的性能

张栋,柯培玲,汪爱英,王香勇,智理

Properties of Functional Decorative Silicon Oxide Films Prepared by PECVD

Dong ZHANG,Peiling KE,Aiying WANG,Xiangyong WANG,Li ZHI

图15 使用不同气源制备的阴极薄膜的XPS图谱Si2p峰

Fig.15 Si2p peak in XPS spectrum of cathode films at different gas sources