用PECVD工艺制备功能装饰氧化硅薄膜的性能
Properties of Functional Decorative Silicon Oxide Films Prepared by PECVD
用PECVD工艺制备功能装饰氧化硅薄膜的性能 |
| 张栋,柯培玲,汪爱英,王香勇,智理 |
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Properties of Functional Decorative Silicon Oxide Films Prepared by PECVD |
| Dong ZHANG,Peiling KE,Aiying WANG,Xiangyong WANG,Li ZHI |
| 图13 增加O2反应气体后阴极薄膜的截面微观形貌 |
| Fig.13 Cross-sectional micro-morphology of cathode film after increasing oxygen reaction gas |
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