用PECVD工艺制备功能装饰氧化硅薄膜的性能

张栋,柯培玲,汪爱英,王香勇,智理

Properties of Functional Decorative Silicon Oxide Films Prepared by PECVD

Dong ZHANG,Peiling KE,Aiying WANG,Xiangyong WANG,Li ZHI

图8 在250℃制备的阳极薄膜的截面微观形貌

Fig.8 Cross-sectional micro-morphology of anode film formed at 250℃