基于磁控溅射法显微CT W-Al透射靶材的制备及其性能研究*
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RESEARCH ON THE PREPARATION AND PERFOR-MANCE OF TUNGSTEN-ALUMINUM TRANSMIS-SION TARGET FOR MICRO-COMPUTED TOMOGRAPHY BY MAGNETRONSPUTTERING
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图4. 不同模式不同加速电压下YXLON原机和3种厚度W-Al透射靶出射的X射线强度及其所需功率 |
Fig.4. X-ray emitting efficiency (a, c, e) and its production power dependence (b, d, f) of W-Al transmission target of YXLON and W-Al transmission target with three thicknesses under different acceleration voltages and models (a, b) nano-focus model (c, d) micro-focus model (e, f) high-power model |
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