750 ℃热暴露对定向层片组织铸造TiAl合金室温拉伸塑性的影响

朱春雷, 李胜, 李海昭, 张继

EFFECT OF THERMAL EXPOSURE AT 750 ℃ ON ROOM TEMPERATURE TENSILE DUCTILITY OF CAST TiAl ALLOY WITH DIRECTIONAL LAMELLAR MICROSTRUCTURE

ZHU Chunlei, LI Sheng, LI Haizhao, ZHANG Ji

表1 750 ℃, 200 h热暴露后贫Al层的EPMA点扫描分析结果

Table 1 EPMA results for Al-depleted layer after exposure at 750 ℃ for 200 h

Distance from substrate / μm O Ti Al V Cr 1 0 63.88 31.36 3.61 1.15 3 5.23 60.34 30.24 3.27 0.93 5 20.78 46.22 29.73 1.80 1.48