Structure and Properties of Ultrathin Tetrahedral Amorphous Carbon Films

doi:10.11901/1005.3093.2019.265

Chinese Journal of Materials Research

2020, Vol. 34

Issue (5): 379-384 DOI: 10.11901/1005.3093.2019.265

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Structure and Properties of Ultrathin Tetrahedral Amorphous Carbon Films

XU Shipeng¹^,³, WANG Hua¹^,³, CHEN Weiqian¹^,³, LI Yuhong¹^,³, LI Yujun¹(

), WANG Aiying²(

)

1.Jiuquan Vocational and Technical College, Gansu Key Laboratory of Solar Power Generation System Project, Jiuquan 735000, China
2.Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
3.Jiuquan New Energy Research Institute, Jiuquan 735000, China

Cite this article:

XU Shipeng, WANG Hua, CHEN Weiqian, LI Yuhong, LI Yujun, WANG Aiying. Structure and Properties of Ultrathin Tetrahedral Amorphous Carbon Films. Chinese Journal of Materials Research, 2020, 34(5): 379-384.

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Abstract

Ultrathin tetrahedral amorphous carbon (ta-C) films with different film thickness were prepared by filtered cathodic vacuum arc technique. The accurate measurement of the film thickness and sp³C content of the ultrathin ta-C films was conducted by means of ellipsometry combined with spectrophotometry. The acquired film thickness was further verified by XRD. The film density was acquired from the results of precise determination of lattice parameters. Raman spectroscopy were conducted to characterize the atomic bond structure of as-prepared film. The residual stress was calculated from the curvature of the film/substrate composite using Stoney^，s equation. Results show that as the film thickness increased from 7.6 to 33.0 nm there was no obvious change of the ultrathin ta-C film growth rate, which keeps constant as 1.7±0.1 nm/min, while the residual compressive stress and sp³ fraction decreased; for the film of thickness 7.6 nm the maximal sp³ fraction was obtained. The results are consistent with Raman's. For the film of thickness 11.0 nm, the maximal bulk layer density was 3070 kg/m³. The film thickness had no obvious influence on surface roughness of ultrathin ta-C films. In summary, ellipsometry combined with spectrophotometry is of feasible means for characterizing the structure and thickness of the ultrathin ta-C films. X-ray reflection can be used to measure the density and surface roughness of ultrathin ta-C carbon films of high quality.

Key words: inorganic non-metallic materials characterization thickness ta-C

Received: 22 May 2019

ZTFLH:

O484

Fund: National Natural Science Foundation of China(51772307);Gansu Province Science and Technology Innovation Platform Program(1505JTCF039);Scientific Research Project of Gansu Institutions of Higher Learning(2019A-248);Scientific Research Project of Gansu Institutions of Higher Learning(2020A-267)

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	Shipeng XU
	Hua WANG
	Weiqian CHEN
	Yuhong LI
	Yujun LI
	Aiying WANG

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https://www.cjmr.org/EN/10.11901/1005.3093.2019.265 OR https://www.cjmr.org/EN/Y2020/V34/I5/379

Fig.1 Thickness and growth rate of ultrathin ta-C films as a function of deposition time

Fig.2 XRR spectra of ultrathin ta-C films with different thickness

Fig.3 Thickness of ultrathin ta-C films by XRR and spectroscopic ellipsometry

Fig.4 Schematic of three layers ultrathin ta-C films fitting in XRR

Table 1 Thickness, density and surface roughness of ultrathin ta-C carbon films by XRR

Fig.5 Surface roughness of ultrathin ta-C films by XRR and SPM with different film thickness

Table 2 Thickness and sp³ content of ultrathin ta-C carbon films by a combined ellipsometry and spectrophotometry approach

Fig.6 Raman spectra (a), G position and Dis (G) (b) of ultrathin ta-C films with different film thickness

Fig.7 Residual compressive stress of ultrathin ta-C films as a function of thickness

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