Preparation and Polishing Performance of Dendritic Mesoporous Silica Particle Abrasives

doi:10.11901/1005.3093.2019.100

Chinese Journal of Materials Research

2019, Vol. 33

Issue (10): 742-748 DOI: 10.11901/1005.3093.2019.100

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Preparation and Polishing Performance of Dendritic Mesoporous Silica Particle Abrasives

WANG Wanying¹,CHEN Ailian^2,³,MA Xiangyu¹,CAI Wenjie¹,CHEN Yang¹(

)

1. School of Materials Science and Engineering, Changzhou University, Changzhou 213164, China
2. School of Mechanical Engineering, Changzhou University, Changzhou 213164, China
3. Jiangsu Key Laboratory of Green Process Equipment, Changzhou 213164, China

Cite this article:

WANG Wanying,CHEN Ailian,MA Xiangyu,CAI Wenjie,CHEN Yang. Preparation and Polishing Performance of Dendritic Mesoporous Silica Particle Abrasives. Chinese Journal of Materials Research, 2019, 33(10): 742-748.

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Abstract

The dendritic mesoporous silica particles (DMSPs) with Y-type mesochannels were synthesized via an oil-water biphase stratification reaction with decahydronaphthalene as the upper oil phase. The spherical DMSPs were then characterized by means of TEM, SEM, Low-angle XRD, nitrigen adsorption/desorption and particle size distribution. Results show that the prepared particles presented an average particle size of 72±6 nm with a narrow size distribution; The DMSPs presented three-dimensional central-radial mesochannels with an average pore inner diameter of 7.7 nm; The formed mesopores presented the lack of long-range order. After polishing with DMSPs abrasives, the root-mean-square roughness of oxidized silicon workpieces reduced from 0.76 to 0.21 nm. The maximum asperity height in sectional profiles decreased from 1.48 to 0.50 nm, and the maximum valley depth reduced from 1.86 to 0.45 nm. An average removal rate of 187 nm/min was achieved. Furthermore, the interfacial friction and wear behavior and contact adhesion effect of DMSPs abrasives were also discussed.

Key words: inorganic non-metallic materials mesoporous silica dendritic particle abrasive polishing

Received: 12 February 2019

ZTFLH:

TB383

Fund: National Natural Science Foundation of China(51405038);National Natural Science Foundation of China(51575058);National Natural Science Foundation of China(51875052)

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	Wanying WANG
	Ailian CHEN
	Xiangyu MA
	Wenjie CAI
	Yang CHEN

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https://www.cjmr.org/EN/10.11901/1005.3093.2019.100 OR https://www.cjmr.org/EN/Y2019/V33/I10/742

Table 1 Experimental parameters of polishing tests

Fig.1 Low-(a) and high-magnification (b) TEM images of DMSPs samples

Fig.2 SEM image (a) and particle size distribution (b) of DMSPs samples

Fig.3 N₂ adsorption/desorption isotherms (a) and pore size distributions (b) of DMSPs samples

Fig.4 Wide- and low-angle (inset) XRD patterns of DMSPs samples

Fig.5 Top-view AFM images and sectional profiles of the surfaces (a, b) before and (c, d) after finishing with DMSPs particle abrasives

Fig.6 Three-dimensional AFM images of the surfaces (a) before and (b) after polishing

Fig.7 Surface morphology within 722.1 μm×962.8 μm of the polished surface

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