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基体偏压对HiPIMS制备非晶碳膜结构和光电性能的影响 |
王丽1,2, 郭鹏2, 左潇2, 张栋2, 黄美东1(), 柯培玲2, 汪爱英2() |
1 天津师范大学物理与材料科学学院 天津 300387 2 中国科学院宁波材料技术与工程研究所 中国科学院海洋新材料与应用技术重点实验室 浙江省海洋材料与防护技术重点实验室 宁波 315201 |
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Influence of Substrate Bias on Microstructure, Optical- and Electrical- Properties of Amorphous- Carbon Films Prepared by High Power Pulse Magnetron Sputtering |
Li WANG1,2, Peng GUO2, Xiao ZUO2, Dong ZHANG2, Meidong HUANG1(), Peiling KE2, Aiying WANG2() |
1 Tianjin Normal University College of Physics and Materials Science, Tianjin 300387, China 2 Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials of Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China |
引用本文:
王丽, 郭鹏, 左潇, 张栋, 黄美东, 柯培玲, 汪爱英. 基体偏压对HiPIMS制备非晶碳膜结构和光电性能的影响[J]. 材料研究学报, 2018, 32(4): 283-289.
Li WANG,
Peng GUO,
Xiao ZUO,
Dong ZHANG,
Meidong HUANG,
Peiling KE,
Aiying WANG.
Influence of Substrate Bias on Microstructure, Optical- and Electrical- Properties of Amorphous- Carbon Films Prepared by High Power Pulse Magnetron Sputtering[J]. Chinese Journal of Materials Research, 2018, 32(4): 283-289.
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